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The word "Jin" was elected as the Japanese Chinese character of the year in 2024. According to NHK, on the afternoon of December 12, local time, Kiyomizu Temple in Kyoto, Japan announced the word "Jin" as the Japanese Chinese character of the year in 2024. According to the report, this year's word "gold" has two meanings. One is that athletes such as Japanese Olympic athletes have performed well and issued a shining "golden light"; The second is the political black gold problem in Japanese politics and frequent robberies caused by underground part-time jobs, because the pronunciation of "gold" in Japanese, like the word "shadow", also implies the meaning of "shadow". (China News Network)Pakistan KSE-100 index rose 0.5% to 111,504.90.Daiwa Capital Market raised the target price of Tesla from $285 to $420.

The main contract of CSI 500 stock index futures (IC) expanded to 1.00% in the day and is now reported at 6104.4 points. The main contract of CSI 500 stock index futures (IC) stood at 6100 points, rising by 0.99% in the day.The word "Jin" was elected as the Japanese Chinese character of the year in 2024. According to NHK, on the afternoon of December 12, local time, Kiyomizu Temple in Kyoto, Japan announced the word "Jin" as the Japanese Chinese character of the year in 2024. According to the report, this year's word "gold" has two meanings. One is that athletes such as Japanese Olympic athletes have performed well and issued a shining "golden light"; The second is the political black gold problem in Japanese politics and frequent robberies caused by underground part-time jobs, because the pronunciation of "gold" in Japanese, like the word "shadow", also implies the meaning of "shadow". (China News Network)Shenzhen Component Index opened at 10942.05 points in the afternoon, up 0.86%. The GEM index opened at 2,297.69 points in the afternoon, up 1.60%. The small and medium-sized board opened at 11,810.25 points in the afternoon, an increase of 0.61%; The Shanghai Composite Index opened at 3,455.06 points in the afternoon, up 0.66%. The Shanghai and Shenzhen 300 Index opened at 4023.60 points in the afternoon, up 0.87%.

Nanchang land port "Changsha-Xiamen-Hong Kong Link" rail-sea intermodal train was opened. On the morning of December 12th, two trains loaded with "Made in Jiangxi" drove out of Nanchang land port in turn under the supervision of Ganjiang New District Customs, marking the official opening of the "Changsha-Xiamen-Hong Kong Link" rail-sea intermodal train from Nanchang land port to Xiamen Port, which greatly boosted the construction of modern logistics system in Jiangxi to a new level. Compared with the past, under the new mode of "Changsha-Xiamen-Hong Kong Link", the transportation efficiency of goods destined for Southeast Asia is shortened by 5-7 days, and the transportation cost is reduced by 20%. (CCTV News)Lan Foan, Minister of Finance, met with Georgieva, Managing Director of the International Monetary Fund. On December 9, Lan Foan, Minister of Finance, met with Georgieva, Managing Director of the International Monetary Fund. The two sides exchanged views on the global and China economic situation, the focus of China's fiscal policy and the debt of developing countries, accompanied by Liao Min, Vice Minister of Finance.Intel: Breakthrough progress has been made in chip interconnection, and the inter-line capacitance has been reduced by 25%. Recently, Intel OEM announced a major breakthrough in on-chip interconnection technology. The latest subtractive Ruthenium interconnection technology of the company can reduce the inter-line capacitance by up to 25%, effectively improving the on-chip interconnection. According to reports, the subtractive ruthenium interconnection technology has achieved great progress in interconnection miniaturization by using ruthenium, a new, key and alternative metallization material, and using thin film resistivity and airgap. This process does not need an expensive photolithographic air gap exclusion zone around the via, and it can also avoid using a self-aligned via that is selectively etched. When the spacing is less than or equal to 25 nm, the air gap realized by reducing ruthenium interconnection technology can reduce the capacitance between lines by up to 25%, which can be used as a metallization scheme to replace copper damascene process in closely spaced layers. It is reported that this solution is expected to be applied in the future process nodes of Intel OEM. (Sina Technology)